Mosfet

  • Uploaded by: api-26783388
  • 0
  • 0
  • November 2019
  • PDF

This document was uploaded by user and they confirmed that they have the permission to share it. If you are author or own the copyright of this book, please report to us by using this DMCA report form. Report DMCA


Overview

Download & View Mosfet as PDF for free.

More details

  • Words: 711
  • Pages: 13
MOSFET I-V Characteristics

MOSFET Structure • MOS Capacitor – Inversion forms channel

• Reverse Biased Junctions – Source fills channel – Drain empties channel – Current of inversion charge by drift!

I-V Characteristics • Regions of operation – Regions of operation • Triode and Linear region

– Pinch-off • Saturation • Channel Shortening • Early Effect

– Body Effect

Equivalent Circuit • gm • gmb • Leakage currents • RC constants • Capacitances

Recap of MOS-C relations • • • • • • • • • •

Beyond strong Inversion VGB = φMS + ΨS + Vox (1) QG + Qox + QB + Qinv = 0 (2) For ΨS = 0 : VGB = VFB QB = 0; Qinv = 0 QG = CoxVox = - Qox VFB = φMS - Qox/Cox For ΨS = 2ΨB : VGB = VT; Qinv = 0 QB(2ΨB) = [ 2 εSi q NA(2ΨB)]1/2 VT = VFB + 2ΨB + [ 2 εSi q NA(2ΨB)]1/2/Cox

Assumptions in Derivation of I-V Characteristics • VGS = VGB = φMS + Vox(x) + ψS(x) • ψS(x) = 2ψB + V(x) – Gradual Channel Approximation

• V(x) = Vch(x) + VSB – Vch(x) = voltage with respect to source

• 2ψB = qNAwmax2/ 2εS – Strong Inversion Approximation

• Vox = Eox tox – Charge free oxide

Threshold Voltage • For MOS capacitor

– Voltage required at gate with respect to bulk silicon VGB = VT for inversion charge to form at the oxidesilicon interface i.e. ψS = 2ψB – VT = VFB + 2ΨB + [ 2 εSi q NA(2ΨB) / Cox]1/2

• For MOSFET

– Voltage required at gate with respect to source VGS = VTh to form inversion channel at the source end i.e. ψS = 2ψB – VGS = VTh0 if VSB ≠ 0 – VTh0 = VFB + 2ΨB + [ 2 εSi q NA(2ΨB) / Cox]1/2 – Note inversion channel need not extend from source to drain; inversion charge Qinv(x) is channel charge Qch(x); it must exist at least at source end.

Derivation of I-V Characteristics • Assume: – VSB = 0 => VGS = VGB – Channel complete – Qch(x) ≠ 0 for any x

• VGS = VGB = φMS + Vox(x) + ψS(x) • ψS(x) = 2ψB + V(x) = 2ψB + Vch(x) • Cox Vox = εox Eox tox/tox = εox Eox = Dox • Cox Vox = - (Qox+ Qch(x)+ QB) • VGS – V(x) = φMS - (Qox+ Qch(x)+ QB)/Cox + 2ψB

Channel Charge • VGS – V(x) = φMS - (Qox+ Qch(x)+ QB)/Cox + 2ψB • VTh0 = [φMS - (Qox+ QB)/Cox + 2ψB] • VGS – V(x) – VTh0 = - Qch(x)/Cox • Qch(x) => Mobile charge per unit area – Qch(x). W. dx = q nch(x) tch(x) W dx – Qch(x) = q nch(x) tch(x)

Current in Device • • • • •

Consider dx length of channel at x J(x) = - q nch(x) µ (dV/dx) IDS = - J(x)W tch(x) IDS = q nch(x) µ (dV/dx)W tch(x) Qch(x) = q nch(x) tch(x) ; V = f(x)

• VGS – V(x) – VTh0 = - Qmob(x)/Cox • Qch(V) = Cox [VGS – V(x) – VTh0] • IDS = Qch(x) µ (dV/dx)W • IDS dx = Qch(V) µ W dV

I-V Characteristics - II • IDS dx = Qch(V) µ W dV • IDS dx = Cox [VGS – V(x) – VTh0] µ W dV • Integrating : – x -> 0 – L, – V(0) = 0, V(L) = VDS

• IDS L = µ W Cox ([VGS – VTh0] VDS - 1/2 VDS2) • IDS = µCox(W/L)([VGS – VTh0] VDS - 1/2 VDS2)

Saturation region • IDS = µ Cox (W/L) ([VGS –VTh0 ] VDS - 1/2 VDS2)

• Maxima at VDS = [VGS –VTh0 ] • At Maxima: • IDS = 1/2 µ Cox (W/L) [VGS –VTh0]2 • Point of pinch-off • Increase in voltage does not cause increase in current

Operation • VT referred to source – VGS = VGB – VSB

• Operation – VSB = 0, VDS => small – IDS = µnCox [W/L] (VGS – VTh) VDS • TECHNOLOGY parameters - µnCox • Aspect ratio – Design Parameters - [W/L] • Circuit parameters-(VGS – VTh) VDS

Related Documents

Mosfet
November 2019 31
Mosfet
April 2020 19
Mosfet
November 2019 27
Mosfet
May 2020 11
Mosfet
December 2019 23
Mosfet
November 2019 22