Fan Dry Coil Unit System For Acc 5th Rev.c

National Taipei p University y of Technology gy

The 5th Asian Aerosol Conference Aug 26~29 2007

Department of Energy and Refrigerating Air-Conditioning Engineering.

Novell Air N Ai Distribution Di t ib ti System S t for f Cleanrooms with high heat heat-load load and high particle sources Presenter: C.K Chang1, Ad i Adviser :S S.C.Hu C H 2, Koji K ji T Toda d 3 1.Master Student of National Taipei University of Technology , Department of Energy and Refrigerating Air-Conditioning Engineering. 2.Professor of National Taipei University of Technology D Department t t off Energy E and d Refrigerating R fi ti Ai Air-Conditioning C diti i E Engineering. i i 3.General Manager of Taiwan Mika Engineering Consultant Co., Ltd. Registered Building Services Engineer of Japan 1

Contents

The 5th Asian Aerosol Conference Aug 26~29 2007

• 1.Introduction • 2.Description of existing g system y • 3.Problems in existing system • 4. Roadmap of semiconductor technology • 5.Description of proposed system • 6.Comparison • 7.Conclusions

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1. Introduction

The 5th Asian Aerosol Conference Aug 26~29 2007

Motivation and Reasons 1.Rapid Change of production Line In Taiwan IT Industries 2.Incerased Productivity in the same cleanroom space

Comments and Problems ● Fixed Location of Return Air Shaft/Wall and Dry Coiling Coil

● High heat-load demand ● Un-uniform Un uniform temperature ● Un-steady humidity in the rainy day ● Cleanness Decline

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2. Description of existing system (FFU+DCC)

The 5th Asian Aerosol Conference Aug 26~29 2007 FFU: Fan Filter Unit DCC: Dry Cooling Coil

MAU to handle outside air dew point to maintain humidity of cleanroom

RAG: Return Air Grille MAU: Make Up Units

DCC to treat sensible heat of process tools

OA

MAU

FFU to provide driving force to keep cleanroom positive pressure and recirculation i l i air i to achieve hi cleanness level in the room

FFU

DCC 30~50 Pa

DCC R

FFU Ext.Sp 100Pa

A

Heat

S RAG 15~20 Pa

Vf =0.3 ~0.5 m/s

Non-unidirectional Non unidirectional CR ISO Class: 6~8 T:23±3OC, Hu:50±5% Pressure:+15Pa

R A

Heat

S RAG

4

3. Problems in existing system - 1

The 5th Asian Aerosol Conference Aug 26~29 2007

1.External 1 External static pressure of FFU to be over 100Pa to overcome pressure resistance of RAG,RAS.DCC.

Air

P i l Particle

infiltration

invasion

Heating /Coolin g invasion

Moisture

OA

invasion

MAU

FFU

-85 85 Pa DCC 30~50 Pa

DCC R

FFU Ext.Sp Ext Sp 100Pa

A

Heat

S RAG 15~20 Pa

Vf =0.3 ~0.5 m/s

Non-unidirectional CR SO Class: C ass 6 6~8 8 ISO T:23±3OC, Hu:50±5% Pressure:+15Pa

R A

Heat

S RAG

5

3. Problems in existing system - 2

The 5th Asian Aerosol Conference Aug 26~29 2007

2.Downward cold supply air from FFU to encounter upward air current due to the heat-load from process tools.

OA

T:10~36OC Hu: 20%~90% MAU

ADP:14.5OC

FFU DCC

DCC

R A S

R

Heat Particle

Non-unidirectional Non unidirectional CR ISO Class: 6~8 T:23±3OC, Hu:50±5% Pressure:+15Pa

Heat Particle

A S

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3. Problems in existing system - 3

The 5th Asian Aerosol Conference Aug 26~29 2007

3.Fixed position of return air shaft and dry cooling coil

OA

MAU

FFU

DCC 30~50 Pa

DCC R

FFU Ext.Sp Ext Sp 100Pa

A

Heat

S RAG 15~20 Pa

Vf =0.3 ~0.5 m/s

Non-unidirectional CR SO Class: C ass 6 6~8 8 ISO T:23±3OC, Hu:50±5% Pressure:+15Pa

R A

Heat

S RAG

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4. Roadmap of semiconductor technology

（abstracted from ITRS2005）

The 5th Asian Aerosol Conference Aug 26~29 2007 Year

2005

2010

2015

2020

80nm 1.2nm

45nm 0.7nm

25nm 0.6nm

14nm 0.5nm

40nm

23nm

13nm

(7nm)

Acid(SO4)

1000 pptM

500 pptM

500 pptM

500 pptM

Base(NH3)

5000 pptM

2500 pptM

2500 pptM

2500 pptM

Condensable Organics

4000 pptM

2500 pptM

2500 pptM

2500 pptM

10 pptM

10 pptM

10 pptM

10 pptM

Acid(SO4, slicidation)

100 pptM (430ng/m³)

10 pptM

10 pptM

10 pptM

Base(NH3, reticle stocker)

2500 pptM (1900 / ³) (1900ng/m³)

TBD

TBD

TBD

Organics (one-day exposed surface)

2 ng/cm²

0.5 ng/cm²

0.5 ng/cm²

0.5 ng/cm²

Dopants (one-day exposed surface)

2×10¹² atom/cm²

1×10¹² atom/cm²

1×10¹² atom/cm²

1×10¹² atom/cm²

Whole clean room

ISO Class6

ISO Class6

ISO Class7

ISO Class8

Inside of minienvironment

ISO Class2

ISO Class1

ISO Class1

ISO Class1

【Devices】 minimum feature size gate oxide thickness

【Contamination control】 minimum particle size Chemical contamination (general environment)

Dopants(B,P) Chemical contamination(local environment)

Chemical contamination(wafer surface)

【Cleanness of cleanroom】

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5.Description of proposed system

The 5th Asian Aerosol Conference Aug 26~29 2007

MAU to handle outside air dew point to maintain humidity of cleanroom

FFU: Fan Filter Unit FDCU: Fan Dry Coil Units

MAU: Make Up Units

Low external p pressure of FFU to provide driving force to keep cleanroom positive pressure and recirculation air to achieve cleanness l level l l in i the th room

FDCU to treat sensible heat of process tools and overcome the p pressure drop p of coiling coil

OA MAU

FFU

FFU Ext.. Static Pressure: 30Pa

-15 Pa

FDCU

Non-unidirectional CR ISO Class: 6~8 T:23±3OC, Hu:50±5% Pressure:+15Pa 9

6.Comparison - 1

The 5th Asian Aerosol Conference Aug 26~29 2007

Supply air chamber pressure to be -85 Pa

OA

Existing system

External static pressure of FFU to be over100Pa to overcome pressure resistance of RAG,RAS.DCC.

FFU

R A S

+15Pa C/R Pressure to maintain +15Pa

RAG

Proposed system

OA

FDCU

Supply air chamber pressure down to -15 Pa FFU

External static pressure of FFU can be under 30Pa

+15Pa C/R Pressure to maintain +15Pa

Less negative pressure in the supply air chamber (from -85 Pa to -15 Pa) 10

6.Comparison - 2

The 5th Asian Aerosol Conference Aug 26~29 2007

Existing system

Air infiltration

OA

Air infiltration =3600 α A

-85 Pa

2.∆P/ρ

α=0.8, ρ=1.2kg/m3, .∆P: Pascal

IF A=10cmx10cmx10 =0.1 M2 Air infiltration =3600 x 0.8 x 0.1 x 2x85/1.2 =3428 CMH Air infiltration

-15 Pa

OA

Proposed system Air infiltration =3600 3600 x 0.8 x 0.1 x 2x15/1.2 i filt ti =1440 CMH

Reduced air infiltration 11

6.Comparison - 3

The 5th Asian Aerosol Conference Aug 26~29 2007

Existing system

Large air Infiltration Heat invasion Moisture invasion

Heat invasion =3428cmhx 1.2 x ∆h (Kcal/kg) = 3428x1.2x12 = 49,363Kcal/hr 49,363Kcal/hr≈16.3USRT 16.3USRT

-85 Pa

Moisture invasion =3428cmhx 1.2 x ∆χ (kg/kg) = 3428x1.2x0.0045 = 18.5Kg/h Smaller S ll air i IInfiltration filt ti Heat invasion Moisture invasion -15 Pa

P Proposed d system t Heat invasion=1440cmhx 1.2 x ∆h (Kcal/kg) = 1440x1.2x12 1440x1 2x12 =20,736Kcal/hr≈6.9USRT Moisture invasion =1440cmhx 1440cmhx 1 1.2 2 x ∆χ (kg/kg) i i = 1440x1.2x0.0045 = 7.8Kg/h

Reduced the energy consumption

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6.Comparison - 4

The 5th Asian Aerosol Conference Aug 26~29 2007

Better cleanness level 13

6.Comparison - 5

The 5th Asian Aerosol Conference Aug 26~29 2007 OA

Existing system FFU 0.3M/S~0.5M/S DCC 30~50 Pa

DCC R A

R

Heat

Heat

A

S

S

RAG 15~20 Pa

RAG OA

Proposed system FFU

FDCU FDCU

Uniform temperature distribution in the working area (BOF + 0.9m~1.5m) 14

6.Comparison - 6

The 5th Asian Aerosol Conference Aug 26~29 2007

Existing system

ADP 14.5OC ,10% of Supply volume

14.5x0.1+18x0.9/1=17.650C To:180C

14.50C

FFU 0.3 M/S~0.5 M/S

DCC

To:180C DCC

R

Heat

A

Ts:17.650C

R

Heat

S

A S

Proposed system FFU

FDCU

ADP:14.50C

To:20~24 0C

Ti:23.50C Ti:23.50C

14.5x0.1+20~24x0.9/1=19~23 14 5 0 1 20 24 0 9/1 19 23 0C To:20~24 0C

FDCU

Ti:26~30 300C Ts:19.45~23 T 19 45 230C Ti:26

Ti:26~30 Ti:26 300C According to heat-load of process tools to design the dry coiling coil

Accuracy and high COP to treat heat of process tools 15

6.Comparison - 7

The 5th Asian Aerosol Conference Aug 26~29 2007

Existing system DCC

Return Air Shaft

FFU

Clean Room 1k Return Air Grille

Proposed system

FFU

FDCU

Clean Room 1k

Fan Dry Cooling Unit to treat sensible heat of process tools Return air shaft cancelled to increase production area

15% increased production area 16

6.Comparison - 8

The 5th Asian Aerosol Conference Aug 26~29 2007 OA

Existing system

FFU Ext.Sp 100Pa FFU 0.35M/S~0.45M/ S

Fixed DCC location R

Fixed RAS location

A

Heat

Heat

R A

S

S

RAG 15~20 Pa

RAG

Proposed system FDCU can be relocated with the

Ball room system

process tools

FDCU can be relocated with the process tools 17

7.Conclusions

The 5th Asian Aerosol Conference Aug 26~29 2007

Green Cleanroom , Innovation , Environmental Friendly

Increased Production Area

Less negative pressure

Reduced Energy

Uniform Temperature

Reduced Initial cost

Flexible Relocation

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National Taipei University of Technology Department of Energy and Refrigerating Air-Conditioning Engineering.

The 5th Asian Aerosol Conference Aug 26~29 2007

National N i l Taipei T i i University U i i off Technology T h l Department of Energy and Refrigerating Air-conditioning Engineering Shih-Cheng Hu, Ph.D Andy Chang Toda Koji E-mail:[email protected] E-mail:[email protected] E-mail:[email protected] 19