Chuyen De 2

  • November 2019
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Micro-stereolithography (MSTL) techniques

ThS. Phùng Xuân Lan Bộ Môn Công nghệ Chế tạo máy Khoa Cơ Khí

Nguyên lý quang hoá polymer

The irradiance at any point within the resin

Gaussian laser beam scan for SL

vs = Laser Scan Speed Critical Exposure dp= Penetration Depth Power

Ec = P = Laser

The laser exposure along the x axis

The curing depth

One spot curing with Gaussian beam

The maximum cured line width

Các phương pháp MSTL

Microstereolithography techniques

Projection methods

Scanning methods

Two photon

One photon

Classical MSTL

Constrained surface

Multi-polymer

Hybrid

IH process

IH process

IH process

Dynamic mask

LCD

IH process series

Free surface

IH process

Real mask

Mass

Super

IH process

IH process

DMD

Các phương pháp MSTL

Kích thích 1 photon và 2 photon

Surface techniques

• The microstructure is fabricated relatively easily

• It takes relatively short time to fabricate a microstructure

• The fabrication time for the making of the layer is relatively long

• The solidified photopolymer tends to adhere transparent plate ⇒ Broken and adhered structure

Classical MSTL

Classical MSTL system

• The focusing problem • The fast fabrication speed (comparison to IH process)

Beam scanning over flat resin plane by galvanometric scanner

Hệ thống MSTL (IH - Integrated Harden Process)

Ikuta et al 1993

Schematic diagram of apparatus for IH process • The capability of building real 3D and high-aspect ratio microstructures (µm)

• The possibility of fabricating different materials • The lower fabrication than classical MSTL

Super IH Process

• No layer preparation Ikuta et al 1998

• High resolution (better than 1µm in 3D space) • Fabrication of a real 3D structure without any support parts nor sacrificial layers • Micro-parts with free moving elements • The expensive optic systems

Two photon Process Maruo et al 1996

• No layer preparation Schematic diagram of two photon process

• Fabrication of real 3D structure without any support parts nor sacrificial layers • Sub-micro resolution • Large extent of 3D fabrication in depth (comparison with super IH process) • Ultra-fast fabrication (comparison with super IH process) • The freely movable structure

Mask projection Bertsch et.al 1995

Real mask projection MSTL

• The fabrication speed is improved significantly

compared with scanning MSTL • For truly 3D microstructures, a number of masks need to made (time consuming and expensive)

Dynamic mask projection MSTL using LCD

• The complex 3D micro-object can be fabricated quickly whatever its pattern may be • The lateral dimension is limited by the low resolution and low contrast of the LCD • The LCD is opaque to UV light, only with visible light sources

Hệ thống MSTL - IMS Lab - Postech

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